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Minimizing plasma damage and in situ sealing of ultra low-k dielectric films by using of oxygen free fluorcarbon plasma
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Authors
Mannaert, Geert
;
Baklanov, Mikhaïl
;
Le, Quoc Toan
;
Travaly, Youssef
;
Boullart, Werner
;
Vanhaelemeersch, Serge
Conference
Proceedings 6th International Conference on Microelectronics and Interfaces
Title
Minimizing plasma damage and in situ sealing of ultra low-k dielectric films by using of oxygen free fluorcarbon plasma
Publication type
Proceedings paper
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