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The use of ion implantation of strained silicon on SiO2 for nanoelectronic devices

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1880 since deposited on 2021-10-16
3last month
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Acq. date: 2026-04-26

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1880 since deposited on 2021-10-16
3last month
1last week
Acq. date: 2026-04-26

Citations