Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Conference contributions
View item
imec Publications Repository
imec Publications
Conference contributions
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity
View/
open
10480.pdf (254.5Kb)
Metadata
Show full item record
Authors
Paraschiv, Vasile
;
Claes, Martine
;
Baklanov, Mikhaïl
;
Boullart, Werner
;
De Gendt, Stefan
;
Vanhaelemeersch, Serge
Conference
Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
Title
HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections
Conference contributions
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login