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HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity
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Acq. date: 2026-05-17
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Acq. date: 2026-05-17
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2 since deposited on 2021-10-16
Acq. date: 2026-05-17
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2001 since deposited on 2021-10-16
2last month
Acq. date: 2026-05-17
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