Authors

Puurunen, Riikka; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Green, Martin; Brijs, Bert; Richard, Olivier; Bender, Hugo; Conard, Thierry; Hoflijk, Ilse; Vandervorst, Wilfried; Hellin, David; Vanhaeren, Danielle; Zhao, Chao; De Gendt, Stefan; Heyns, Marc

Issue

7

Journal

Applied Physics Letters

Volume

86

Title

Hafnium oxide films by atomic layer deposition for high-k gate dielectric applications: analysis of the density of nanometer-thin films

Publication type

Journal article