Authors

Sa, N.; Kang, J.F.; Yang, H.; Liu, X.Y.; He, Y.D.; Han, R.Q.; Ren, C.; Yu, HongYu; Chan, D.S.H.; Kwong, D.-L.

Issue

26

Journal

IEEE Electron Device Letters

Volume

9

Title

Mechanism of positive-bias temperature instability in sub-1 nm TaN/HfN/HfO2 gate stack with low preexisting traps

Publication type

Journal article