Publication:

PVD-HfSiON gate dielectrics with Ni-FUSI electrode for 65nm LSTP application

Date

2005
Journal article
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Author(s)

Yamamoto, Kazuhiko
;
Kubicek, Stefan  
;
Rothschild, Aude
;
Mitsuhashi, Riichirou
;
Deweerd, Wim
;
Veloso, Anabela  
;
Jurczak, Gosia  
;
Biesemans, Serge  
;
De Gendt, Stefan  
;
Wickramanayaka, S.
;
Hayashi, S.
;
Niwa, Masaaki

Journal

Microelectronic Engineering

Abstract

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