TEM characterization of extended defects induced in Si wafers by H-plasma treatment

Author(s)

Ghica, C.

;

Nistor, L.C.

;

;

;

Van Tendeloo, G.

;

Ulyashin, A.

Journal of Physics D: Applied Physics

1946 since deposited on 2021-10-16

445item.page.metrics.field.last-week

Acq. date: 2025-10-25