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Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
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Authors
Le, Quoc Toan
;
Chiodarelli, Nicolo
;
Blum, Ivan
;
Kesters, Els
;
Lux, Marcel
;
Claes, Martine
;
Vereecke, Guy
;
Mertens, Paul
Conference
Surface Preparation and Cleaning Conference
Title
Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
Publication type
Proceedings paper
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