Publication:
Selective epitaxy of Si/SiGe to improve pMOS devices by recessed Source/Drain or buried SiGe channels
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1854 since deposited on 2021-10-16
1last month
Acq. date: 2026-04-06
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Statistics
Views
1854 since deposited on 2021-10-16
1last month
Acq. date: 2026-04-06
Citations