Publication:
Fermi-level pinning at polycrystalline silicon-HfO2 interface as a source of drain and gate current 1/f noise
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1958 since deposited on 2021-10-16
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Acq. date: 2026-01-08
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1958 since deposited on 2021-10-16
5last month
4last week
Acq. date: 2026-01-08
Citations