Approach for a standardized methodology for multisite processing of 300-mm wafers at R&D sites

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15454.pdf 569 KB

Author(s)

Oechsner, Richard

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Schellenberger, M.

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Journal

IEEE Trans. Semiconductor Manufacturing

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1935 since deposited on 2021-10-16

1last month

Acq. date: 2025-12-08