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Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications, using RELACS shrink and corresponding OPC
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Authors
Op de Beeck, Maaike
;
Versluijs, Janko
;
Wiaux, Vincent
;
Vandeweyer, Tom
;
Ciofi, Ivan
;
Struyf, Herbert
;
Hendrickx, Dirk
;
Van Olmen, Jan
Conference
Optical Microlithography XX
Title
Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications, using RELACS shrink and corresponding OPC
Publication type
Proceedings paper
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