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Publication:

High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric

Date

2007

Proceedings Paper

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Author(s)

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Biesemans, Serge

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Statistics

1930 since deposited on 2021-10-16

Acq. date: 2026-07-27