Publication:
High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric
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1928 since deposited on 2021-10-16
2last month
1last week
Acq. date: 2026-01-09
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Metrics
Views
1928 since deposited on 2021-10-16
2last month
1last week
Acq. date: 2026-01-09
Citations