Publication:

The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics

Date

2008-07

Journal article

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Author(s)

;

;

Chang, Vincent S.

;

;

Jakschik, Stefan

;

Conard, Thierry

;

Hantschel, Thomas

;

Delabie, Annelies

;

Adelmann, Christoph

;

Van Elshocht, Sven

;

Ragnarsson, Lars-Ake

;

;

Absil, Philippe

;

Biesemans, Serge

Journal

IEEE Electron Device Letters

Statistics

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