Authors

Cho, Hag-Ju; Yu, Hong Yu; Chang, Vincent S.; Akheyar, Amal; Jakschik, Stefan; Conard, Thierry; Hantschel, Thomas; Delabie, Annelies; Adelmann, Christoph; Van Elshocht, Sven; Ragnarsson, Lars-Ake; Schram, Tom; Absil, Philippe; Biesemans, Serge

ISSN

0741-3106

Issue

7

Journal

IEEE Electron Device Letters

Volume

29

Title

The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics

Publication type

Journal article