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Low-voltage 6T FinFET SRAM cell with high SNM using HfSiON/TiN gate stack, fin widths down to 10nm and 30nm gate length
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Authors
Collaert, Nadine
;
von Arnim, Klaus
;
Rooyackers, Rita
;
Vandeweyer, Tom
;
Mercha, Abdelkarim
;
Parvais, Bertrand
;
Witters, Liesbeth
;
Nackaerts, Axel
;
Altamirano Sanchez, Efrain
;
Demand, Marc
;
Hikavyy, Andriy
;
Demuynck, Steven
;
Devriendt, Katia
;
Bauer, F.
;
Ferain, Isabelle
;
Veloso, Anabela
;
De Meyer, Kristin
;
Biesemans, Serge
;
Jurczak, Gosia
Conference
IEEE International Conference on IC Design and Technology - ICICDT
Title
Low-voltage 6T FinFET SRAM cell with high SNM using HfSiON/TiN gate stack, fin widths down to 10nm and 30nm gate length
Publication type
Proceedings paper
Embargo date
9999-12-31
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