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Etch challenges brought by the metal hardmask approach for advanced contact patterning with fluorocarbon-based plasma
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Authors
de Marneffe, Jean-Francois
;
Goossens, Danny
;
Shamiryan, Denis
;
Lazzarino, Frederic
;
Struyf, Herbert
;
Boullart, Werner
Conference
60th Annual Gaseous Electronics Conference
Title
Etch challenges brought by the metal hardmask approach for advanced contact patterning with fluorocarbon-based plasma
Publication type
Meeting abstract
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