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A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
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Authors
de Marneffe, Jean-Francois
;
Goossens, Danny
;
Vandervorst, Alain
;
Demuynck, Steven
;
Goethals, Mieke
;
Hermans, Jan
;
Van Roey, Frieda
;
Baudemprez, Bart
;
Brus, Stephan
;
Vrancken, Christa
Conference
American Vacuum Society Fall Meeting
Title
A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
Publication type
Meeting abstract
Embargo date
9999-12-31
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