Publication:

A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography

Date

2008
Meeting abstract
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Author(s)

de Marneffe, Jean-Francois  
;
Goossens, Danny  
;
Vandervorst, Alain
;
Demuynck, Steven  
;
Goethals, Mieke
;
Hermans, Jan  
;
Van Roey, Frieda  
;
Baudemprez, Bart  
;
Brus, Stephan  
;
Vrancken, Christa  

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