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Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
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Authors
Dilliway, G.
;
Pierreux, D.
;
Fischer, P.
;
Menou, Nicolas
;
Pawlak, Malgorzata
;
Wang, Xin Peng
;
Wouters, Dirk
Conference
8th International Conference on Atomic Layer Deposition - ALD
Title
Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
Publication type
Proceedings paper
Embargo date
9999-12-31
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