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Surface termination of HfO2 in W/HfO2 gated metal-oxide-semiconductor stacks from thermal stability point of view
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1946 since deposited on 2021-10-17
1last month
Acq. date: 2026-03-17
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Statistics
Views
1946 since deposited on 2021-10-17
1last month
Acq. date: 2026-03-17
Citations