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The influence of fluoride based gate etch process on the current collapse of AlGaN/GaN HEMTs
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Authors
Lorenz, Anne
;
John, Joachim
;
Derluyn, Joff
;
Cheng, Kai
;
Das, Jo
;
Germain, Marianne
;
Borghs, Gustaaf
Conference
32nd Workshop on Compound Semiconductor Devices and Integrated Circuits - WOCSDICE
Title
The influence of fluoride based gate etch process on the current collapse of AlGaN/GaN HEMTs
Publication type
Meeting abstract
Embargo date
9999-12-31
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