Authors

Noori, Atif; Balseanu, Mihaela; Boelen, Pieter; Cockburn, Andrew; Demuynck, Steven; Felch, Susan; Gandikota, Srinivas; Gelatos, jerry; Khandelwal, Amit; Kittl, Jorge; Lauwers, Anne; Lee, Wen-Chin; Lei, Jianxin; Mandrekar, Tushar; Schreutelkamp, Rob; Shah, Kavita; Thompson, Scott; Verheyen, Peter; Wang, Ching-Ya; Xia, Li-Qun; Arghavani, Reza

ISSN

0018-9383

Issue

5

Journal

IEEE Transactions on Electron Devices

Volume

55

Title

Manufacturable processes for =32-nm-node CMOS enhancement by synchronous optimization of strain-engineered channel and external parasitic resistances

Publication type

Journal article