Publication:
H2O- and O3-based atomic layer deposition of high-K dielectric films on GeO2 passivation layers
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2026 since deposited on 2021-10-17
1last month
Acq. date: 2026-04-06
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Statistics
Views
2026 since deposited on 2021-10-17
1last month
Acq. date: 2026-04-06
Citations