Investigation of mask defect density in full field EUV lithography

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Authors
Jonckheere, Rik; Van Den Heuvel, Dieter; Lamantia, Matthew; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Vandenberghe, Geert; Ronse, Kurt
Conference
International Symposium on Extreme Ultraviolet Lithography
Title
Investigation of mask defect density in full field EUV lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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