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The role of additives and deposition parameters in Cu plating of high aspect ratio vias
Publication:
The role of additives and deposition parameters in Cu plating of high aspect ratio vias
Date
2009-10
Meeting abstract
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18575.pdf
289.78 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ko, Ted
;
Radisic, Alex
;
Armini, Silvia
;
Vereecken, Philippe
;
Drijbooms, Chris
;
Bender, Hugo
;
Sun, S.P.
;
Wann, C.
;
Yu, C.H.
;
Leunissen, Peter
;
Ruythooren, Wouter
;
Vanhaelemeersch, Serge
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Abstract
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1849
since deposited on 2021-10-17
Acq. date: 2025-10-28
Citations
Metrics
Views
1849
since deposited on 2021-10-17
Acq. date: 2025-10-28
Citations