SLM device for 193 nm lithographic applications

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Authors

Lauria, John; Albright, R.; Vladimirsky, O.; Hoeks, M.; Vanneer, R.; van Drieenhuizen, B.; Chen, L.; Haspeslagh, Luc; Witvrouw, Ann

ISSN

0167-9317

Issue

4_6

Journal

Microelectronic Engineering

Volume

86

Title

SLM device for 193 nm lithographic applications

Publication type

Journal article

Embargo date

9999-12-31

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