Authors

Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd R.; Whittaker, Andrew K.

Conference

International Symposium on Extreme Ultraviolet Lithography

Title

Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography

Publication type

Proceedings paper

Embargo date

9999-12-31