Authors

Vellianitis, Georgios; Van Dal, Mark; Boccardi, Guillaume; Duriez, Blandine; Voogt, Frans; Kaiser, Monja; Witters, Liesbeth; Lander, Rob

ISSN

0018-9383

Issue

7

Journal

IEEE Transactions on Electron Devices

Volume

56

Title

The influence of TiN thickness and SiO2 formation method on the structural and electrical properties of TiN/HfO2/SiO2 gate stacks

Publication type

Journal article

Embargo date

9999-12-31