Publication:
Influence of Si precursor on Ge segregation during ultrathin Si reduced pressure chemical vapor deposition on Ge
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1783 since deposited on 2021-10-18
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Acq. date: 2026-01-06
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Views
1783 since deposited on 2021-10-18
2last month
2last week
Acq. date: 2026-01-06
Citations