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Interplay between dry etch and wet clean in patterning La2O3/HfO2-containing high-k/metal gate stacks
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Authors
Vos, Ingrid
;
Hellin, David
;
Vrancken, Christa
;
Geypen, Jef
;
Bender, Hugo
;
Vecchio, Emma
;
Paraschiv, Vasile
;
Vertommen, Johan
;
Boullart, Werner
Conference
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
Title
Interplay between dry etch and wet clean in patterning La2O3/HfO2-containing high-k/metal gate stacks
Publication type
Proceedings paper
Embargo date
9999-12-31
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