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Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects
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Authors
Wilson, Chris
;
Croes, Kristof
;
Zhao, Chao
;
Metzger, T.H.
;
Zhao, Larry
;
Beyer, Gerald
;
Horsfall, A.B.
;
O'Neill, A.G.
;
Tokei, Zsolt
ISSN
0021-8979
Issue
5
Journal
Journal of Applied Physics
Volume
106
Title
Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects
Publication type
Journal article
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