Authors

Wilson, Chris; Zhao, Chao; Zhao, Larry; Metzger, T.H.; Tokei, Zsolt; Croes, Kristof; Pantouvaki, Marianna; Beyer, Gerald; Horsfall, A.B.; O Neill, A.G.

ISSN

0003-6951

Issue

18

Journal

Applied Physics Letters

Volume

94

Title

Study of the effect of dielectric porosity on the stress in advanced Cu/low-k interconnects using x-ray diffraction

Publication type

Journal article