Authors

Yu, H.Y; Chang, S.Z.; Aoulaiche, Marc; Kaczer, Ben; Absil, Philippe; Adelmann, Christoph; Hoffmann, Thomas Y.; Biesemans, Serge; Wann, C; Mii, Y.J

Conference

International Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA

Title

High-k/ metal-gate stack work-function tuning by rare-earth capping layers: interface dipole or bulk charge?

Publication type

Proceedings paper