Publication:
Wafer level characterization of the sacrificial HDP oxide lateral etching by anhydrous vapor HF with ethanol vapor for SiGe MEMS structures
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1951 since deposited on 2021-10-18
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Acq. date: 2026-02-24
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1951 since deposited on 2021-10-18
2last month
2last week
Acq. date: 2026-02-24
Citations