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300mm wafer thinning and backside passivation compatibility with temporary wafer bonding for 3D stacked IC applications
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300mm wafer thinning and backside passivation compatibility with temporary wafer bonding for 3D stacked IC applications
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Date
2010-11
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jourdain, Anne
;
Buisson, Thibault
;
Phommahaxay, Alain
;
Privett, Marc
;
Wallace, Daniel
;
Sood, Sumant
;
Bisson, Peter
;
Beyne, Eric
;
Travaly, Youssef
;
Swinnen, Bart
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2108
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Acq. date: 2026-01-11
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Views
2108
since deposited on 2021-10-18
2
last month
Acq. date: 2026-01-11
Citations