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Exploring the ALD Al2O3/ In0.53Ga0.47As and Al2O3/Ge interface properties: a common gate stack approach for advanced III-V/Ge CMOS
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Acq. date: 2026-02-28
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2 since deposited on 2021-10-18
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1986 since deposited on 2021-10-18
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Acq. date: 2026-02-28
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