Authors

Lin, Dennis; Waldron, Niamh; Brammertz, Guy; Martens, Koen; Wang, Wei-E; Sioncke, Sonja; Delabie, Annelies; Bender, Hugo; Conard, Thierry; Tseng, W.H.; Lin, S.C.; Temst, K.; Vantomme, Andre; Mitard, Jerome; Caymax, Matty; Meuris, Marc; Heyns, Marc; Hoffmann, Thomas Y.

Conference

Graphene, Ge/III-V, and Emerging Materials for Post-CMOS Applications 2

Title

Exploring the ALD Al2O3/ In0.53Ga0.47As and Al2O3/Ge interface properties: a common gate stack approach for advanced III-V/Ge CMOS

Publication type

Proceedings paper

Embargo date

9999-12-31