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Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers
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1868 since deposited on 2021-10-18
Acq. date: 2026-01-09
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Views
1868 since deposited on 2021-10-18
Acq. date: 2026-01-09
Citations