Charging of submicron structures during silicon dioxide etching in one

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Authors

Palov, P.A.; Mankelevich, Yu. A.; Rakhimova, T. V.; Shamiryan, Denis

ISSN

1063-780X

Issue

10

Journal

Plasma Physics Reports

Volume

36

Title

Charging of submicron structures during silicon dioxide etching in one

Publication type

Journal article

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