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A comparative X-ray photoelectron spectroscopy and medium-energy ion-scattering study of ultra-thin, Hf-based high-k films
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A comparative X-ray photoelectron spectroscopy and medium-energy ion-scattering study of ultra-thin, Hf-based high-k films
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Date
2010
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sygellou, L
;
Ladas, S
;
Reading, M.A.
;
van den Berg, J.A.
;
Conard, Thierry
;
De Gendt, Stefan
Journal
Surface and Interface Analysis
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Views
1964
since deposited on 2021-10-18
1
last month
1
last week
Acq. date: 2026-08-05
Citations