Authors

Vincent, Benjamin; Loo, Roger; Vandervorst, Wilfried; Brammertz, Guy; Caymax, Matty

ISSN

0022-0248

Issue

19

Journal

Journal of Crystal Growth

Volume

312

Title

Low temperature Si homo-epitaxy by reduced pressure chemical vapor deposition using dichlorosilane, silane and trisilane

Publication type

Journal article

Embargo date

9999-12-31