Authors

Altamirano Sanchez, Efrain; Paraschiv, Vasile; Demand, Marc; Boullart, Werner

ISSN

0167-9317

Issue

9

Journal

Microelectronic Engineering

Volume

88

Title

Dry etching fin process for SOI finFET manufacturing: Transition from 32 to 22 nm 3 node on a 6T-SRAM cell

Publication type

Journal article