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Relation between trap creation and breakdown during tunnelling current stressing of sub 3nm gate oxide
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Relation between trap creation and breakdown during tunnelling current stressing of sub 3nm gate oxide
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Date
1997
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1824.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Depas, Michel
;
Heyns, Marc
Journal
Microelectronic Engineering
Abstract
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1846
since deposited on 2021-09-30
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last month
Acq. date: 2025-12-16
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Metrics
Views
1846
since deposited on 2021-09-30
2
last month
Acq. date: 2025-12-16
Citations