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Aqueous solutions for low-temperature photoannealing of functional oxide films: reaching the 400 degrees C Si-technology integration barrier
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Authors
De Dobbelaere, C.
;
Calzada, M.L.
;
Jimenez, R.
;
Ricote, J.
;
Bretos, I.
;
Mullens, J.
;
Hardy, An
;
Van Bael, Marlies
ISSN
0002-7863
Issue
33
Journal
Journal of the American Chemical Society
Volume
133
Title
Aqueous solutions for low-temperature photoannealing of functional oxide films: reaching the 400 degrees C Si-technology integration barrier
Publication type
Journal article
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