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In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition : Initial growth of HfO2 on Si and Ge substrates
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1885 since deposited on 2021-10-19
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Acq. date: 2025-10-24
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Views
1885 since deposited on 2021-10-19
419item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations