Chemical mechanical polishing of Ge using colloidal silica particles and H2O2

Metadata

Show full item record

Authors

Ong, Patrick; Peddeti, Shivaji; Leunissen, Peter; Babu, S. V.

ISSN

1099-0062

Issue

7

Journal

Electrochemical and Solid-State Letters

Volume

14

Title

Chemical mechanical polishing of Ge using colloidal silica particles and H2O2

Publication type

Journal article

Collections

Articles