Authors

Siew, Yong Kong; Stucchi, Michele; Versluijs, Janko; Roussel, Philippe; Kunnen, Eddy; Pantouvaki, Marianna; Beyer, Gerald; Tokei, Zsolt

Conference

IEEE International Interconnect Technology Conference and Materials for Advanced Metallization - IITC/MAM

Title

Line edge roughness (LER) correlation and dielectric reliability with spacer-defined double patterning (SDDP) at 20nm half pitch

Publication type

Proceedings paper