Authors

Vaglio Pret, Alessandro; Poliakov, Pavel; Bianchi, Davide; Gronheid, Roel; Blomme, Pieter; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim

Conference

55th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBN

Title

Impact of EUV lithography line edge roughness on 16 nm memory generation

Publication type

Oral presentation

Embargo date

9999-12-31