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Conference contributions
Gate-last vs. gate-first technology for aggressively scaled EOT Logic/RF CMOS
Publication:
Gate-last vs. gate-first technology for aggressively scaled EOT Logic/RF CMOS
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Date
2011
Proceedings Paper
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22515.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Ragnarsson, Lars-Ake
;
Cho, Moon Ju
;
Devriendt, Katia
;
Kellens, Kristof
;
Sebaai, Farid
;
Suhard, Samuel
;
Brus, Stephan
;
Crabbe, Yvo
;
Schram, Tom
;
Rohr, Erika
;
Paraschiv, Vasile
;
Eneman, Geert
;
Kauerauf, Thomas
;
Dehan, Morin
;
Hong, Sug-Hun
;
Yamaguchi, Shinpei
;
Takeoka, Shinji
;
Higuchi, Yuichi
;
Tielens, Hilde
;
Van Ammel, Annemie
;
Favia, Paola
;
Bender, Hugo
;
Franquet, Alexis
;
Conard, Thierry
;
Li, X.
;
Pey, K.-L.
;
Struyf, Herbert
;
Mertens, Paul
;
Absil, Philippe
;
Horiguchi, Naoto
;
Hoffmann, Thomas Y.
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Acq. date: 2026-01-09
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since deposited on 2021-10-19
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Acq. date: 2026-01-09
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Metrics
Downloads
1
since deposited on 2021-10-19
Acq. date: 2026-01-09
Views
2174
since deposited on 2021-10-19
5
last month
1
last week
Acq. date: 2026-01-09
Citations