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Characterization of modification of 193-nm photoresist by HBr plasma
Publication:
Characterization of modification of 193-nm photoresist by HBr plasma
Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vereecke, Guy
;
Claes, Martine
;
Le, Quoc Toan
;
Kesters, Els
;
Struyf, Herbert
;
Carleer, Robert
;
Adriaensens, Peter
Journal
Electrochemical and Solid-State Letters
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1910
since deposited on 2021-10-19
1
last week
Acq. date: 2025-10-28
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Metrics
Views
1910
since deposited on 2021-10-19
1
last week
Acq. date: 2025-10-28
Citations