Characterization of modification of 193-nm photoresist by HBr plasma

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Authors

Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter

ISSN

1099-0062

Issue

10

Journal

Electrochemical and Solid-State Letters

Volume

14

Title

Characterization of modification of 193-nm photoresist by HBr plasma

Publication type

Journal article

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