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Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment
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Authors
Waldron, Niamh
;
Nguyen, Duy
;
Lin, Dennis
;
Brammertz, Guy
;
Vincent, Benjamin
;
Firrincieli, Andrea
;
Winderickx, Gillis
;
Sioncke, Sonja
;
De Jaeger, Brice
;
Wang, Gang
;
Mitard, Jerome
;
Wang, Wei-E
;
Heyns, Marc
;
Caymax, Matty
;
Meuris, Marc
;
Absil, Philippe
;
Hoffmann, Thomas Y.
Conference
Dielectrics in Nanosystems -and- Graphene, Ge/III-V, Nanowires and Emerging Materials for Post-CMOS Applications 3
Title
Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment
Publication type
Proceedings paper
Embargo date
9999-12-31
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