High-performance Ge MOS capacitors by O2 plasma passivation and O2 ambient annealing

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Authors

Xie, Qi; Deng, Shaoren; Schaekers, Marc; Lin, Dennis; Caymax, Matty; Delabie, Annelies; Jiang, Yu-long; Qu, Xin-Pin; Deduytsche, Davy; Detavemier, Christophe

ISSN

0741-3106

Issue

12

Journal

IEEE Electron Device Letters

Volume

32

Title

High-performance Ge MOS capacitors by O2 plasma passivation and O2 ambient annealing

Publication type

Journal article

Embargo date

9999-12-31

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